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1

Impact of radio frequency source power-induced ion energy on a refractive index of SiN film deposited by a pulsed-PECVD at room temperature

Suyeon Kim, Byungwhan Kim

Journal:

Thin Solid Films

Année:

2010

Langue:

english

Fichier:

PDF, 933 KB

english, 2010

2

Etching profile of silicon carbide in a NF3/CH4 inductively coupled plasma

Byungwhan Kim, Suk Yong Lee, Byung-Teak Lee

Journal:

Microelectronic Engineering

Année:

2004

Langue:

english

Fichier:

PDF, 283 KB

english, 2004

3

Control of plasma equipment by regulating radio frequency impedance matching

Byungwhan Kim, Jang-Hyun Park, Bum Soo Kim

Journal:

Microelectronic Engineering

Année:

2004

Langue:

english

Fichier:

PDF, 314 KB

english, 2004

4

Modeling of plasma process data using a multi-parameterized generalized regression neural network

Byungwhan Kim, Minji Kwon, Sang Hee Kwon

Journal:

Microelectronic Engineering

Année:

2009

Langue:

english

Fichier:

PDF, 183 KB

english, 2009

5

Surface roughness of silicon oxynitride etching in C2F6 inductively coupled plasma

Byungwhan Kim, Byung Teak Lee, Jeon Gun Han

Journal:

Solid-State Electronics

Année:

2007

Langue:

english

Fichier:

PDF, 473 KB

english, 2007

6

Surface roughness of silicon carbide etching in a NF3 inductively coupled plasma

Byungwhan Kim, Kyeon Kyun Lee, Byung Teak Lee

Journal:

Année:

2005

Langue:

english

Fichier:

PDF, 188 KB

english, 2005

7

Microtrench depth and width of SiON plasma etching

Byungwhan Kim, Junggi Bae, Byung Teak Lee

Journal:

Année:

2006

Langue:

english

Fichier:

PDF, 356 KB

english, 2006

8

Oxide via etching in a magnetically enhanced CHF3/CF4/Ar plasma

Byungwhan Kim, Sung-Ku Kwon

Journal:

Solid-State Electronics

Année:

2003

Langue:

english

Fichier:

PDF, 94 KB

english, 2003

9

An optimal neural network plasma model: a case study

Byungwhan Kim, Sungjin Park

Journal:

Chemometrics and Intelligent Laboratory Systems

Année:

2001

Langue:

english

Fichier:

PDF, 391 KB

english, 2001

10

Regulation of plasma discharge using fuzzy logic and an in-situ plasma sensor

Byungwhan Kim, Seongjin Choi

Journal:

International Journal of Control, Automation and Systems

Année:

2012

Langue:

english

Fichier:

PDF, 526 KB

english, 2012

11

Use of neural network to in situ conditioning of semiconductor plasma processing equipment

Byungwhan Kim, Daehyun Kim

Journal:

Applied Soft Computing

Année:

2012

Langue:

english

Fichier:

PDF, 570 KB

english, 2012

12

Design and VLSI implementation of a high-performance face detection engine

Han, Dongil, Choi, Jongho, Kim, Byungwhan, Cho, Jae Il

Journal:

Computers & Electrical Engineering

Année:

2012

Langue:

english

Fichier:

PDF, 3.99 MB

english, 2012

13

Enhanced field emission properties from titanium-coated carbon nanotubes

Uh, Hyung Soo, Park, Sangsik, Kim, Byungwhan

Journal:

Diamond and Related Materials

Année:

2010

Langue:

english

Fichier:

PDF, 2.36 MB

english, 2010

14

Prediction of etch microtrenching using a neural network

Kim, Byungwhan, Lee, Duk Woo, Kwon, Kwang Ho

Journal:

Journal of Applied Physics

Année:

2004

Langue:

english

Fichier:

PDF, 429 KB

english, 2004

15

[IEEE Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future' - Austin, TX, USA (2-4 Oct. 1995)] Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future' - Real-time diagnosis of semiconductor manufacturing equipment using neural networks

Byungwhan Kim,, May, G.S.

Année:

1995

Langue:

english

Fichier:

PDF, 1.09 MB

english, 1995

16

Functional Kernel-Based Modeling of Wavelet Compressed Optical Emission Spectral Data: Prediction of Plasma Etch Process

Young-Don Ko,, Young-Seon Jeong,, Myong-Kee Jeong,, Garcia-Diaz, A., Byungwhan Kim,

Journal:

IEEE Sensors Journal

Année:

2010

Langue:

english

Fichier:

PDF, 565 KB

english, 2010

17

MODELING OF THIN FILM PROCESS DATA USING A GENETIC ALGORITHM-OPTIMIZED INITIAL WEIGHT OF BACKPROPAGATION NEURAL NETWORK

Kim, Byungwhan, Lee, Hwajune, Kim, Donghwan

Journal:

Applied Artificial Intelligence

Année:

2009

Langue:

english

Fichier:

PDF, 426 KB

english, 2009

18

Measurement of surface roughness of plasma-deposited films using laser speckles

Kim, Byungwhan, Seo, Junhyun

Journal:

Applied Surface Science

Année:

2015

Langue:

english

Fichier:

PDF, 1.45 MB

english, 2015

19

A Novel Confusion-Line Separation Algorithm Based on Color Segmentation for Color Vision Deficiency

Han, Dongil, Yoo, Seong Joon, Kim, Byungwhan

Journal:

Journal of Imaging Science and Technology

Année:

2012

Langue:

english

Fichier:

PDF, 4.78 MB

english, 2012

20

Radio Frequency Power Effect on Charge Density of PECVD-SiN Thin Films

KIM, Byungwhan, KIM, Jeong, UH, Hyung Soo

Journal:

Journal of the Ceramic Society of Japan

Année:

2007

Langue:

english

Fichier:

PDF, 877 KB

english, 2007

21

Microtrench of oxynitride thin films in a C2F6 inductively coupled plasma

Byungwhan Kim, Byung Teak Lee

Journal:

Applied Surface Science

Année:

2006

Langue:

english

Fichier:

PDF, 380 KB

english, 2006

22

Radio frequency source power-induced ion energy impact on SiN films deposited by using a pulsed-PECVD in SiH4–N2 plasma at room temperature

Hwajune Lee, Byungwhan Kim, Sanghee Kwon

Journal:

Current Applied Physics

Année:

2010

Langue:

english

Fichier:

PDF, 314 KB

english, 2010

23

Use of adaptive network fuzzy inference system to predict plasma charging damage on electrical MOSFET properties

Byungwhan Kim, Hee Ju Kwon, Seongjin Choi

Journal:

Expert Systems with Applications

Année:

2009

Langue:

english

Fichier:

PDF, 234 KB

english, 2009

24

Wavelet-coupled backpropagation neural network as a chamber leak detector of plasma processing equipment

Byungwhan Kim, Sanghee Kwon

Journal:

Expert Systems with Applications

Année:

2011

Langue:

english

Fichier:

PDF, 864 KB

english, 2011

25

Neural network modeling of inter-characteristics of silicon nitride film deposited by using a plasma-enhanced chemical vapor deposition

Su Jin Lee, Byungwhan Kim, Sung Wook Baik

Journal:

Expert Systems with Applications

Année:

2011

Langue:

english

Fichier:

PDF, 729 KB

english, 2011

26

Wavelet analysis of directional variations of plasma etch profile

Seok Rim Choi, Byungwhan Kim, Beom Soo Kim, Kyeong Kun Lee

Journal:

Microelectronic Engineering

Année:

2004

Langue:

english

Fichier:

PDF, 443 KB

english, 2004

27

Modeling plasma etching process using a radial basis function network

Byungwhan Kim, Kyungyoung Park

Journal:

Microelectronic Engineering

Année:

2005

Langue:

english

Fichier:

PDF, 296 KB

english, 2005

28

Ex-situ plasma diagnosis by combining scanning electron microscope, wavelet, and neural network

Byungwhan Kim, Hyung Soo Uh, Donghwan Kim

Journal:

Materials Science in Semiconductor Processing

Année:

2008

Langue:

english

Fichier:

PDF, 330 KB

english, 2008

29

Temperature effect on deposition rate of silicon nitride films

Byungwhan Kim, Jae Young Park, Kyeong Kyun Lee, Jeon Gun Han

Journal:

Applied Surface Science

Année:

2006

Langue:

english

Fichier:

PDF, 350 KB

english, 2006

30

Use of neural network method to characterize pressure controlled charge density of silicon nitride films deposited by PECVD

Byungwhan Kim, Su Yeon Kim

Journal:

Applied Surface Science

Année:

2008

Langue:

english

Fichier:

PDF, 795 KB

english, 2008

31

Modeling of a hemispherical inductively coupled plasma using neural network

Byungwhan Kim, Suyeon Kim

Journal:

Current Applied Physics

Année:

2009

Langue:

english

Fichier:

PDF, 427 KB

english, 2009

32

Impact of bias power-induced ion energy on refractive index of SiN films room-temperature deposited in SiH4–NH3–N2 pulsed plasma

Sanghee Kwon, Hwajun Lee, Byungwhan Kim

Journal:

Current Applied Physics

Année:

2010

Langue:

english

Fichier:

PDF, 336 KB

english, 2010

33

Deposition rate of SiN film grown by using a pulsed-PECVD at room-temperature

Suyeon Kim, Byungwhan Kim

Journal:

Current Applied Physics

Année:

2010

Langue:

english

Fichier:

PDF, 354 KB

english, 2010

34

Duty ratio-controlled reflective property of silicon nitride films deposited at room temperature using a pulsed-PECVD at SiH4–NH3 plasma

Daehyun Kim, Sujin Lee, Byungwhan Kim, Byung Jun Kang, Donghwan Kim

Journal:

Current Applied Physics

Année:

2011

Langue:

english

Fichier:

PDF, 543 KB

english, 2011

35

GA-optimized backpropagation neural network with multi-parameterized gradients and applications to predicting plasma etch data

Byungwhan Kim, Sungmo Kim

Journal:

Chemometrics and Intelligent Laboratory Systems

Année:

2005

Langue:

english

Fichier:

PDF, 134 KB

english, 2005

36

In-situ monitoring of plasma equipment using spectrophotometric colorimetry and neural network

Byungwhan Kim, Minji Kwon

Journal:

Chemometrics and Intelligent Laboratory Systems

Année:

2011

Langue:

english

Fichier:

PDF, 890 KB

english, 2011

37

Optimization of optical lens-controlled scanning electron microscopic resolution using generalized regression neural network and genetic algorithm

Byungwhan Kim, Sanghee Kwon, Dong Hwan Kim

Journal:

Expert Systems with Applications

Année:

2010

Langue:

english

Fichier:

PDF, 904 KB

english, 2010

38

Prediction of plasma etch process by using actinometry-based optical emission spectroscopy data and neural network

Byungwhan Kim, Minji Kwon

Journal:

Journal of Materials Processing Technology

Année:

2009

Langue:

english

Fichier:

PDF, 395 KB

english, 2009

39

Modeling of silicon oxynitride etch microtrenching using genetic algorithm and neural network

Byungwhan Kim, Junki Bae, Byung Teak Lee

Journal:

Microelectronic Engineering

Année:

2006

Langue:

english

Fichier:

PDF, 401 KB

english, 2006

40

Partial X-ray photoelectron spectroscopy to constructing neural network model of plasma etching surface

Byungwhan Kim, Woo Suk Kim

Journal:

Microelectronic Engineering

Année:

2007

Langue:

english

Fichier:

PDF, 243 KB

english, 2007

41

Wavelet monitoring of spatial surface roughness for plasma diagnosis

Byungwhan Kim, Woo Suk Kim

Journal:

Microelectronic Engineering

Année:

2007

Langue:

english

Fichier:

PDF, 427 KB

english, 2007

42

Advanced neural network model of plasma-driven integrated circuit process data

Byungwhan Kim, Changki Min, Donghwan Kim

Journal:

Materials Science in Semiconductor Processing

Année:

2007

Langue:

english

Fichier:

PDF, 252 KB

english, 2007

43

Prediction of plasma processes using neural network and genetic algorithm

Byungwhan Kim, Jungki Bae

Journal:

Solid-State Electronics

Année:

2005

Langue:

english

Fichier:

PDF, 284 KB

english, 2005

44

Temperature effect on charge density of silicon nitride films deposited in SiH4–NH3–N2 plasma

Byungwhan Kim, Sang Hee Kwon

Journal:

Surface and Coatings Technology

Année:

2008

Langue:

english

Fichier:

PDF, 592 KB

english, 2008

45

Wavelet characterization of plasma etch nonuniformity

Byungwhan Kim, Wan Shick Hong, Kyeong Kyun Lee

Journal:

Thin Solid Films

Année:

2004

Langue:

english

Fichier:

PDF, 420 KB

english, 2004

46

Radio frequency source power effect on silicon nitride films deposited by a room-temperature pulsed-PECVD

Byungwhan Kim, Suyeon Kim

Journal:

Thin Solid Films

Année:

2009

Langue:

english

Fichier:

PDF, 286 KB

english, 2009

47

Refraction properties of PECVD of silicon nitride film

Byungwhan Kim, Dong Won Kim, Seung Soo Han

Journal:

Année:

2004

Langue:

english

Fichier:

PDF, 406 KB

english, 2004

48

Prediction of plasma etching using a randomized generalized regression neural network

Byungwhan Kim, Duk Woo Lee, Kyung Young Park, Serk Rim Choi, Seongjin Choi

Journal:

Année:

2004

Langue:

english

Fichier:

PDF, 272 KB

english, 2004

49

Prediction of plasma-induced DC bias using polynomial neural network

Byungwhan Kim, Dong-Won Kim, Gwi-Tae Park

Journal:

Année:

2005

Langue:

english

Fichier:

PDF, 461 KB

english, 2005

50

Modelling of plasma etching process using radial basis function network and genetic algorithm

Dongil Han, Seung Bin Moon, Kyungyoung Park, Byungwhan Kim, Kyeong Kyun Lee, Nam Jeung Kim

Journal:

Année:

2005

Langue:

english

Fichier:

PDF, 224 KB

english, 2005